A process that utilises accelerated ions to penetrate a solid surface. The implanted ions can be used to modify the surface composition, structure, or property of the solid material. This surface modification depends on the ion species, energy, and flux. The penetration depth can be controlled by adjusting the ion energy and the type of ions used. The total number of ions incorporated into the solid is determined by the ion flux and the duration of implantation. This technique allows for the precise placement of ions in a solid at low temperatures. It is used for many applications such as modifying the electrical properties of semiconductors and improving the mechanical or chemical properties of alloys, metals, and dielectrics.